Recent advancements in lithography have opened new avenues for the construction sector, particularly through the innovative use of inorganic photoresists. A groundbreaking study led by Liqin Liu from the College of Optoelectronic Engineering at Chengdu University of Information Technology reveals the potential of TeO_x, a suboxide chalcogenide thin film, to create intricate nano-patterns through a multimodal lithography approach. This research, published in the journal Materials Research Express, highlights how varying laser exposure power can yield different lithographic effects, a significant leap from traditional single-mode techniques.
Liu’s team utilized a laser direct writing system with a wavelength of 780 nm to explore the lithographic capabilities of TeO_x films, which were fabricated using reactive magnetron sputtering. The results demonstrated an impressive ability to manipulate the material’s phase transition by adjusting the laser power. At lower exposure levels, between 5 mW and 9 mW, the TeO_x film transitioned from an amorphous to a crystalline state, resulting in patterns that featured single trenches. This is particularly useful for applications where only specific crystalline structures need to be developed, as these are the only components that dissolve in alkaline developers.
As the power increased to the medium range of 10 mW to 15 mW, the team observed a fascinating phenomenon. The center of the laser spot, exposed to greater power, transitioned the film from amorphous to crystalline and then back to amorphous due to rapid cooling. This process generated double-trenched patterns with a feature size of 119 nm, approximately one-seventh of the laser wavelength. Liu explained, “By precisely manipulating the laser power ranges, we can achieve multimodal lithographic nano-patterns on the same TeO_x photoresist film. This single-process capability could revolutionize nano-manufacturing.”
At high exposure powers exceeding 16 mW, the laser’s intensity was sufficient to ablate the TeO_x film, leading to unique ablation and redeposition patterns. This versatility in pattern creation not only enhances the efficiency of the lithography process but also broadens the potential applications in sectors such as optical storage and advanced construction technologies.
The implications of this research extend beyond academic interest; they hold significant commercial potential. As the construction industry increasingly integrates advanced materials and technologies, the ability to create precise nano-patterns can lead to innovative building materials and improved structural designs. Enhanced optical storage solutions could also facilitate more efficient data management systems in smart buildings, further driving the sector’s evolution.
With the construction landscape rapidly changing, breakthroughs like those presented by Liu and his colleagues are vital. The research underscores a shift towards more sophisticated manufacturing techniques that promise to enhance both the functionality and aesthetic appeal of future constructions. For more information about Liqin Liu’s work, you can visit College of Optoelectronic Engineering, Chengdu University of Information Technology.
